Achieving Precision Cleaning in Semiconductor Manufacturing with Megasonics

In semiconductor manufacturing, achieving high precision in cleaning processes is crucial to maintaining the performance and reliability of silicon wafers and other sensitive components. The complexity of modern semiconductor devices requires advanced cleaning technologies that can deliver superior precision and efficiency. This is where megasonic cleaners, a key innovation in the industry, come into play. […]

Because a high level of silicon wafer cleanliness is critical for semiconductor product quality, removing contaminating particles is a crucial feature of semiconductor manufacturing. Microscopic particles clinging to wafer surfaces can block silicon etching or the deposit of conducting paths. The resulting products can be defective or have a reduced lifespan. Reducing the particle count […]

The evolution of the semiconductor industry is marked by continuous progress and an unwavering commitment to precision. Central to this journey is the critical process of silicon wafer cleaning, an essential step in the fabrication of semiconductors. As the industry continues to evolve, the demand for more efficient and precise cleaning methods grows, making it […]

When single components need high-precision cleaning, Kaijo’s new Mega Puck Flow silicon wafer cleaning system represents an ideal solution. Silicon wafers, hard disk drive platters, and flat panel display glass are fragile, but films or contaminating particles often have to be removed from their surfaces. The Mega Puck Flow System delivers precise megasonic cleaning while […]

While periodic cleaning is part of many large processing systems, getting parts and components completely clean can be challenging. Conventional cleaning methods can involve time-consuming manual scrubbing or soaking in toxic chemicals. Parts and equipment may be easily damaged. Workers may be injured from manual cleaning methods or exposure to harmful chemicals. Product quality can […]

While ultrasonic systems deliver excellent cleaning performance, large flat panels are difficult to clean completely, even if placed in an oversized ultrasonic cleaning tank. Large tanks may have problems with even cleaning and with the circulation of the cleaning solution. To address this problem Kaijo has developed a new method for cleaning and handling large […]

As production part cleaning requirements become more stringent, environmental regulations are restricting the use of the aggressive chemicals commonly used in large processing systems. Manufacturing lines often incorporate cleaning steps to prepare parts for subsequent processing. Cleaning may include manual scrubbing, pressure washing and soaking in hot chemical baths. Modern products often include heat-sensitive components, […]

Semiconductor manufacturing involves a large number of process steps that etch silicon wafers and deposit thin films. Between the steps, the silicon wafers have to be cleaned to remove traces of chemicals and particles in preparation for the subsequent step. Cleaning is usually done with powerful chemicals such as acids and peroxides that remove undesirable […]

Sound energy propagates not in vacuum the way radio-frequency energy does, but within physical mediums. When matter is subjected to sound energy, it is stimulated in a way that forms a rippling propagation — like waves in a body of water. You would also be able to see sound energy pass through a visible medium […]

Megasonic cleaning systems use high frequency generators and transducers operating in the MHz range to clean delicate parts such as silicon wafers, and related microelectronic devices. Semiconductor manufacturing processes rely on repeated cleaning operations, and megasonic systems clean more rapidly and more completely than other cleaning methods in many applications. Megasonic cleaning systems are especially […]